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Progress In Electromagnetics Research
ISSN: 1070-4698, E-ISSN: 1559-8985
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DEPOLARIZED UPWARD AND DOWNWARD MULTIPLE SCATTERING FROM A VERY ROUGH SURFACE

By C.-Y. Hsieh and A. K. Fung

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Abstract:
From a very roughly random surface the backscattering enhancement is predicted due to the constructive interference of multiple surfaces scattering. For specialized surfaces involving roughness large compared with the incident wavelength, the backscattering enhancement takes place. The phenomenon of backscatter enhancement becomes evident for both larger normalized surface height and surface rms slope. In this paper we take further study to predict the backscattering enhancement mainly comes from upward multiple scattering. On the contrary the downward multiple scattering has no contributions to the scatter strength of backscattering enhancement. The model developed in this paper is based upon the integral equation method and able to predict this phenomenon of multiple scattering and backscattering enhancement. The depolarized multiple scattering makes much contribution along the plane of incidence from random rough surfaces, but depolarized single scattering makes little contributions. The total multiple scattering strength is the summation of upward and downward multiple scattering strength. In comparison of model prediction of total multiple scattering strength with measured data along the specular plane, excellent agreement is obtained.

Citation: (See works that cites this article)
C.-Y. Hsieh and A. K. Fung, "Depolarized Upward and Downward Multiple Scattering from a Very Rough Surface," Progress In Electromagnetics Research, Vol. 54, 199-220, 2005.
doi:10.2528/PIER04100401
http://www.jpier.org/PIER/pier.php?paper=0410041

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