2015-09-18
Experimental and Numerical Investigations of Line-Shaped Microwave Argon Plasma Source
By
Progress In Electromagnetics Research M, Vol. 43, 183-192, 2015
Abstract
In the following, numerical and experimental results for a line-shaped argon plasma source over a wide range of gas pressure (2 Torr-50 Torr) and microwave power (200-800 W) are presented. The line-shaped plasmas have been generated in a rectangular Pyrex tube, 15 mm in height and 5 mm inner width, placed-in a linear slot made in the upper wide wall of a custom-made narrow rectangular waveguide. The microwave power is coupled to the discharge gas via the slot. The effects of the waveguide width, power level (electron density, and discharge tube insertion depth on the excited axial (along x) electric field profile and hence the uniformity of the produced plasmas are investigated numerically using commercial software CST Microwave Studio®, and charge coupled device (CCD) camera. Results showed that, a uniform line-shaped plasma is generated as waveguide width decreased to 58 mm, plasma density value <<nres = 3.7 × 1011 cm-3, and discharge tube insertion depth = 0 mm. An optical emission spectroscopy study was also realized to deduce the relative density of argon species and electron excitation temperature Texc. In general, argon spectral lines intensity was increased enhanced markedly when microwave power increased, while the different lines showed different behavior as argon pressure increased. The electron excitation temperature Texc decreases with increasing argon pressure, but almost constant overall the whole plasma length.
Citation
Essam Abdel-Fattah, Haru Shindo, Refat Sabry, and Alla El Kotp, "Experimental and Numerical Investigations of Line-Shaped Microwave Argon Plasma Source," Progress In Electromagnetics Research M, Vol. 43, 183-192, 2015.
doi:10.2528/PIERM15071004
References

1. Sugai, H., Y. Nojiri, K. Takasu, T. Ishijima, and E. Stamate, "Novel giant-size plasmas produced by microwave discharge with slot antenna array," The 57th GEC, Bull. American Phys. Soc., Vol. 49, No. 5, 10, 2004.        Google Scholar

2. Chabert, P. J., "Electromagnetic effects in high-frequency capacitive discharges used for plasma processing," J. Phys. D: Appl. Phys., Vol. 40, R63-R73, 2007.
doi:10.1088/0022-3727/40/3/R01        Google Scholar

3. Abdel-Fattah, E., "Investigation of capacitively coupled argon plasma driven at various frequencies and validation of surface waves excitation," Physics Letters A, Vol. 377, 297-302, 2013.
doi:10.1016/j.physleta.2012.11.014        Google Scholar

4. Sugai, H., I. Ganachev, and M. Nagatsu, "High-density flat plasma production based on surface waves," Plasma Sources Sci. Technol., Vol. 7, 192-205, 1998.
doi:10.1088/0963-0252/7/2/014        Google Scholar

5. Moisan, M. and J. Pelletiers, Microwave Excited Plasmas (Plasma Technology), Vol. 4, Elsevier, 1992.

6. Ghanachev, I. and H. Sugai, "Multiple eigenmode analysis and density jumps in planar surface-wave plasmas with slot-antenna excitation," Phys. of Plasmas, Vol. 7, 3051-3061, 2000.
doi:10.1063/1.874158        Google Scholar

7. Abdel-Fattah, E., I. Ghanachev, and H. Sugai, "Two-diemensional modeling of slot excited surface waves in bounded planar plasmas," Jpn. J. Appl. Phys., Part 1, Vol. 39, 4181-4187, 2000.        Google Scholar

8. Tatarova, E., F. M. Dias, C. M. Ferreira, V. Guerra, J. Loureiro, E. Stoykova, I. Ghanashev, and I. Zhelyazkov, "Self-consistent kinetic model of a surface-wave-sustained discharge in nitrogen," J. Phys. D: Appl. Phys., Vol. 30, 2663-2676, 1997.
doi:10.1088/0022-3727/30/19/003        Google Scholar

9. Jimenez-Diaz, M., E. A. D. Carbone, J. van Dijk, and J. J. A. M. van der Mullen, "A two-dimensional Plasimo multiphysics model for the plasma electromagnetic interaction in surface wave discharges: The surfatron source," J. Phys. D: Appl. Phys., Vol. 45, 335204-335221, 2012.
doi:10.1088/0022-3727/45/33/335204        Google Scholar

10. Abdel-Fattah, E., I. Ghanachev, and H. Sugai, "Numerical 3D simulation of surface wave excitation in planar-type plasma processing device with a corrugated dielectric plate," Vacuum, Vol. 86, 330-334, 2011.
doi:10.1016/j.vacuum.2011.07.058        Google Scholar

11. Chen, Z., S. Rauf, K. Ramaswamy, and K. Collins, "Electromagnetic modeling of plasma etch chamber for semiconductor microchip fabrication," PIERS Online, Vol. 5, No. 3, 221-225, 2009.
doi:10.2529/PIERS080829175650        Google Scholar

12. Walter, M., D. Korzec, M. Hutten, and G. Engmann, "Computer aided design of microwave plasma sources: Potential and applications," Jpn. J. Appl. Phys., Vol. 36, 4777-4783, 1997.
doi:10.1143/JJAP.36.4777        Google Scholar

13. Liang, L., K. Nakamura, and H. Sugai, "Modeling microwave resonance of curling probe for density measurements in reactive plasmas," Appl. Phys. Express, Vol. 4, 066101-066103, 2011.
doi:10.1143/APEX.4.066101        Google Scholar

14. Yee, K. S., "Numerical solution of initial boundary value problems involving Maxwell’s equations in isotropic media," IEEE Trans. on Antennas and Propagation, Vol. 14, 302-307, 1966.
doi:10.1109/TAP.1966.1138693        Google Scholar

15. Zethoff, M. and U. Kortshagen, "Dispersion characteristics and radial field distribution of surface waves in the collisional regime," J. Phys. D: Appl. Phys., Vol. 25, 1574-1582, 1992.
doi:10.1088/0022-3727/25/11/003        Google Scholar

16. Siry, M., S. Sakata, T. Terebessy, and M. Kando, "Investigation of quartz side wall influence on radial plasma density profiles in low-pressure surface wave plasma source," Jpn. J. Appl. Phys., Vol. 45, 2749-2756, 2006.
doi:10.1143/JJAP.45.2749        Google Scholar

17. Boffard, J., C. Lin, and C. DeJoseph, "Application of excitation cross sections to optical plasma diagnostics," J. Phys. D: Appl. Phys., Vol. 37, R143-R153, 2004.
doi:10.1088/0022-3727/37/12/R01        Google Scholar

18. Griem, H. R., Principle of Plasma Spectroscopy, Cambridge University Press, 1997.
doi:10.1017/CBO9780511524578

19., http://physics.nist.gov/cgi-bin/ATDdata/display.ksh.        Google Scholar

20. Abdel-Fattah, E., S. Fuji, and H. Shindo, "Large-scaled line plasma production by evanescent microwave," Plasma Devices and Operations, Vol. 17, No. 3, 221-228, 2009.
doi:10.1080/10519990902958029        Google Scholar

21. Miotk, R., B. Hrycak, M. Jasinski, and J. Mizeraczyk, "Spectroscopic study of atmospheric pressure 915MHz microwave plasma at high argon flow rate," Journal of Physics: Conference Series, Vol. 406, 012033-012043, 2012.
doi:10.1088/1742-6596/406/1/012033        Google Scholar