volume | PIER Journals

Abstract

There are various techniques for the deposition of SiO₂ films on silicon. Flame Hydrolysis Deposition (FHD) techniques is the most economical technique for the deposition of SiO₂ films. In this technique the SiO₂ films are deposited by hydrolysis of SiCl₄ in a high temperature H₂-O₂ flame. In the present study we present the growth of SiO₂ films by indigenously developed FHD system and organic compound Tetraethoxyorthosiliate/Tetraethoxysilane TEOS as source of silicon. The films deposited by the FHD system are porous and need annealing at higher temperatures for the densification. We present here for the first time direct dense glassy transparent SiO₂ films deposited by our FHD system. The optical properties of the deposited films were studied by ellipsometery. FTIR spectroscopy was carried out to study the various characteristic peaks of SiO₂ bonds. The peaks corresponding to Si-O-Si stretching, bending and rocking modes are observed at 1090 cm^-1, 812 cm^-1 and 463 cm^-1 respectively. The absence of peaks corresponding to the OH bond in the deposited film reveals that the deposited films are most suitable for the photonic devices application. The surface analysis was carried out using SEM. The EDAX of the deposited film confirms the composition of the Si and O in the deposited film.

1. Abdalla, M. A. and Z. Hu, "On the study of left-handed coplanar waveguide coupler on ferrite substrate," Progress In Electromagnetics Research Letters, Vol. 1, 69-75, 2008.
doi:10.2528/PIERL07111808 Google Scholar

2. Yang, T., S. Song, H. Dong, and R. Ba, "Waveguide structures for generation of terahertz radiation by electro-optical process in GaAs and ZnGeP2 using 1.55 m fiber laser pulses," Progress In Electromagnetics Research Letters, Vol. 2, 95-102, 2008.
doi:10.2528/PIERL07122806 Google Scholar

3. Wen, F. and B.-J. Wu, "Diffraction efficiency enhancement of guided optical waves by magnetostatic forward volume waves in the Yttrium-Iron-Garnet waveguide coated with perfect mental layers," Progress In Electromagnetics Research B, Vol. 1, 209-218, 2008.
doi:10.2528/PIERB07103003 Google Scholar

4. Sotoodeh, Z., B. Biglarbegian, F. H. Kashani, and H. Ameri, "A novel bandpass waveguide filter structure on SIW technology," Progress In Electromagnetics Research Letters, Vol. 2, 141-148, 2008.
doi:10.2528/PIERL08010204 Google Scholar

5. Amjadi, S. M. and M. Soleimani, "Design of band-pass waveguide filter using frequency selective surfaces loaded with surface mount capacitors based on split-field update fdtd method," Progress In Electromagnetics Research B, Vol. 3, 271-281, 2008.
doi:10.2528/PIERB07122402 Google Scholar

6. Mondal, M. and A. Chakrabarty, "Resonant length calculation and radiation pattern synthesis of longitudinal slot antenna in rectangular waveguide," Progress In Electromagnetics Research Letters, Vol. 3, 187-195, 2008.
doi:10.2528/PIERL08042204 Google Scholar

7. Park, J. K., J. N. Lee, D. H. Shinan, and H. J. Eom, "A full-wave analysis of a coaxial waveguide slot bridge using the fourier transform technique," Journal of Electromagnetic Waves and Applications, Vol. 20, No. 2, 143-158, 2006.
doi:10.1163/156939306775777198 Google Scholar

8. Li, Y. Y., P. F. Gu, M. Y. Li, H. Yan, and X. Liu, "Research on the wide-angle and broadband 2D photonic crystal polarization splitter," Journal of Electromagnetic Waves and Applications, Vol. 20, No. 2, 265-273, 2006.
doi:10.1163/156939306775777242 Google Scholar

9. El Sabbagh, M. A. and M. H. Bakr, "Analytical dielectric constant sensitivity of ridge waveguide filters," Journal of Electromagnetic Waves and Applications, Vol. 20, No. 3, 363-374, 2006.
doi:10.1163/156939306775701731 Google Scholar

10. Maurya, S. N., V. Singh, B. Prasad, and S. P. Ojha, "Modal analysis and waveguide dispersion of an optical waveguide having a cross-section of the shape of a cardioid," Journal of Electromagnetic Waves and Applications, Vol. 20, No. 8, 1021-1035, 2006.
doi:10.1163/156939306776930277 Google Scholar

11. Chang, H.-W. and W.-C. Cheng, "Analysis of dielectric waveguide termination with tilted facets by analytic continuity method," Journal of Electromagnetic Waves and Applications, Vol. 21, No. 12, 1653-1662, 2007. Google Scholar

12. Kawachi, M., "Silica waveguides on silicon and their application to integrated optic components," Optical and Quantum Elec., Vol. 22, 391, 1990.
doi:10.1007/BF02113964 Google Scholar

13. Valette, S., S. Renard, H. Denis, J. P. Jadot, A. Founier, P. Philippe, P. Gidon, and E. Desgranges, "Si-based integrated optics technologies," Solid State Technol., Vol. 32, No. 2, 69, 1989. Google Scholar

14. Henry, C. H., G. E. Blonder, and R. F. Kazarinov, "Glass waveguides on silicon for hybrid optical packaging," J. Lightwave Technol., Vol. 7, 1530, 1989.
doi:10.1109/50.39094 Google Scholar

15. Izawa, T., H. Mori, Y. Murakami, and N. Shimizu, "Deposited silica waveguide for integrated optical circuits," Appl. Phys. Lett., Vol. 38, 483, 1981.
doi:10.1063/1.92426 Google Scholar

16. Kawachi, M., M. Yasu, and T. Edahiro, "Fabrication of SiO₂-TiO₂ glass planar optical waveguides by Flame Hydrolysis Deposition," Electro. Lett., Vol. 19, No. 5, 583, 1983.
doi:10.1049/el:19830398 Google Scholar

17. Kawachi, M., M. Yasu, and M. Kobayashi, "Flame Hydrolysis Deposition of SiO₂-TiO₂ glass planar optical waveguide on silicon," Jpn. J. Appl. Phys., Vol. 22, 1932, 1983.
doi:10.1143/JJAP.22.1932 Google Scholar

18. Nourshargh, N. A., E. M. Starr, and T. M. Ong, "Integrated optic 1 × 4 splitter in SiO/GeO₂," Electron. Lett., Vol. 25, 981, 1989.
doi:10.1049/el:19890656 Google Scholar

19. Kashyap, R., B. J. Ainslie, and G. D. Maxwell, "Second harmonic generation in GeO₂ rigid waveguide," Electron. Lett., Vol. 25, 206, 1989.
doi:10.1049/el:19890148 Google Scholar

20. Hickernell, F. S., "Optical waveguides on silicon," Solid State Technol., Vol. 31, No. 11, 83, 1988. Google Scholar

21. Kim, Y. J. and D. W. Shin, "Compositional analysis of SiO₂ optical film fabricated by Flame Hydrolysis Deposition," Journal of Ceramic Processing Research, Vol. 3, No. 3, 186-191, 2002. Google Scholar

22. Lucovsky, G., M. J. Manitini, J. K. Srivastava, and E. A. Irene, "Low temperature growth of silicon dioxide films: A study of chemical bonding by ellipsometry and infrared spectroscopy," J. Vac. Sci. Technol. B, Vol. 5, No. 2, 530, 1987.
doi:10.1116/1.583944 Google Scholar

23. Rojas, S., et al. "Properties of silicon dioxide films prepared by low-pressure chemical vapor deposition from tetraethylorthosilicate," J. Vac. Sci. Technol. B, Vol. 8, No. 6, 1177-1184, Nov/Dec. 1990.
doi:10.1116/1.584937 Google Scholar

24. Becker, F. S., D. Pawlik, H. Anzinger, and A. Spitzer, "Low-pressure deposition of highquality SiO₂ films by pyrolisis of tetraethylorthosilicate," J. Vac. Sci. Technol. B, Vol. 5, 1555, 1987.
doi:10.1116/1.583673 Google Scholar

25. Sassela, A., "Tetrahedron model for the optical dielectric function of H-rich silicon oxynitride," Phy. Rev. B, Vol. 48, 14208, 1993.
doi:10.1103/PhysRevB.48.14208 Google Scholar

26. Gallener, F. L., "Band limits and the vibrational spectra of tetrahedral glasses," Phy. Rev. B, Vol. 19, 4292, 1979.
doi:10.1103/PhysRevB.19.4292 Google Scholar

27. Sen, P. N. and M. F. Thorpe, "Phonons in AX₂ glasses: From molecular to band like modes," Phys. Rev. B, Vol. 15, 4030, 1977.
doi:10.1103/PhysRevB.15.4030 Google Scholar

28. Boyd, I. W., "Deconvolution of the infrared absorption peak of the vibrational stretching mode of silicon dioxide: Evidence for structural order?," Appl. Phys. Lett., Vol. 51, 418, 1987.
doi:10.1063/1.98408 Google Scholar

29. Tolstoy, V. P., I. V. Chernysnova, and V. A. Skryshevsky, Handbook of Infrared Spectroscopy of Ultrathin Films, John Wile & Sons Inc., 2003.

30. Kim, Y. T., S. M. Cho, Y. G. Seo, H. D. Yoon, Y. M. Im, and D. H. Yoon, "Influence of hydrogen on SiO₂ thick film deposited by PECVD and FHD for silica optical waveguide," Cryst. Res. Technol., Vol. 37, No. 12, 1257-1263, 2002.
doi:10.1002/crat.200290000 Google Scholar

31. Edahiro, T., M. Kawachi, S. Sudo, and S. Tomaru, "Deposition properties of high silica particles in the flame hydrolysis reaction for optical fiber fabrication," Jap. J. Appl. Phys., Vol. 19, No. 11, 2047-2054, 1980.
doi:10.1143/JJAP.19.2047 Google Scholar

32. Shin, H., J.-H. Yi, J.-G. Baek, and M. Choi, "Preperation and characterization of SiO₂-B₂O₃-P₂O₅ particles and films generated by flame hydrolysis deposition for planar lightwave circuits," J. Material Res., Vol. 17, No. 2, 315-322, 2002.
doi:10.1557/JMR.2002.0045 Google Scholar

33. Pliskin, W. A. and H. S. Lehman, "Structural evaluation of silicon oxide films," J. Electrochem Soc., Vol. 112, 1013, 1965.
doi:10.1149/1.2423333 Google Scholar

34. Shirai, H. and R. Takeda, "Determination of thickness of thin thermal oxide layers on Czochralski grown silicon wafers from their longitudinal optical vibrational mode," Jpn. J. Appl. Phys., Vol. 35, 3876, 1996.
doi:10.1143/JJAP.35.3876 Google Scholar

35. Devine, R. A. B., "Structural nature of the Si/SiO₂ interface through infrared spectroscopy," Appl. Phys. Lett., Vol. 68, 3108, 1996.
doi:10.1063/1.116438 Google Scholar

36. Bjorkman, C. H., T. Yamazaki, S. Miyazaki, and M. Hirose, "Analysis of infrared attenuated total reflection spectra from thin SiO₂ films on Si," J. Appl. Phys., Vol. 77, 313, 1995.
doi:10.1063/1.359394 Google Scholar

Dr. Jaspal Bange

Dr. Lalit Patil

Dr. Dinesh Gautam