In this work, based on the principle of the electromagnetic reflection and transmission, we first present a theoretical analysis of a super-resolving lens with anti-reflection and phase control coatings (ARPC). This ARPC is capable of reducing the reflectivity of superlens surface and making phase difference approaching zero. The principle of ARPC is discussed in detail and the engineer condition for super-resolution imaging is obtained and the best range of the permittivity of ARPC coatings is obtained. The results demonstrate that the subwavelength resolution of our lens with ARPC has been enhanced. Such remarkable imaging capability using ARPC promises new potential for nanoscale imaging and lithography.
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