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PIER PIER B PIER C PIER M PIER Letters
2025-02-16
Ultra-Compact Photonic Isolator Based on Bias-Free Magneto-Optical Thin Films
By
Gianni Portela,

    Dr. Gianni Portela

    School of Electrical and Computer Engineering, University of Campinas

    Brazil

    Homepage

Yisheng Ni,

    Dr. Yisheng Ni

    Tokyo Institute of Technology

    Japan

    Homepage

Kotaro Sato,

    Dr. Kotaro Sato

    Institute of Science Tokyo

    Japan

    Homepage

Yuya Shoji,

    Dr. Yuya Shoji

    Tokyo Institute of Technology

    Japan

    Homepage

Hugo Enrique Hernandez-Figueroa

    Dr. Hugo Enrique Hernandez-Figueroa

    Department of Communications, School of Electrical and Computer Engineering

    University of Campinas

    Brazil

    Homepage

Progress In Electromagnetics Research, Vol. 182, 77-83, 2025
doi:10.2528/PIER24121704
Abstract
An ultra-compact isolator based on the integration of aluminum-substituted cobalt ferrite films with magneto-optical activity to a silicon microring resonator is suggested. The strong remanent magnetization of the employed magneto-optical material allows the operation of the device without any external magnetizing elements, and the device footprint is only 150 μm2. A prototype chip has been fabricated using conventional processes compatible with the silicon on an insulator platform, and a maximum isolation ratio of 7 dB at the 1557.6 nm wavelength has been achieved. To the best of our knowledge, this is the most compact photonic isolator demonstrated to date, and it is suitable for all-optical circuits with extremely high integration density.
Citation
Gianni Portela, Yisheng Ni, Kotaro Sato, Yuya Shoji, and Hugo Enrique Hernandez-Figueroa, "Ultra-Compact Photonic Isolator Based on Bias-Free Magneto-Optical Thin Films," Progress In Electromagnetics Research, Vol. 182, 77-83, 2025.
doi:10.2528/PIER24121704
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